Ukadaulo wa physical vapor deposition (Physical Vapor Deposition, PVD) umatanthawuza kugwiritsa ntchito njira zakuthupi pansi pa vacuum kuti zisungunuke pamwamba pa gwero la zinthu (zolimba kapena zamadzimadzi) kukhala ma atomu ampweya kapena mamolekyu, kapena kuyika ma ion mu ma ion, ndikudutsa otsika. - mpweya wopanikizika (kapena plasma). Njira, ukadaulo woyika filimu yopyapyala yokhala ndi ntchito yapadera pamwamba pa gawo lapansi, komanso kuyika kwa nthunzi wakuthupi ndi imodzi mwamaukadaulo akulu azachipatala. PVD (physical vapor deposition) ukadaulo wopaka utoto umagawidwa m'magulu atatu: zokutira za vacuum evaporation, zokutira za vacuum sputtering ndi zokutira za vacuum ion.
Zogulitsa zathu zimagwiritsidwa ntchito makamaka mu evaporation yamafuta ndi zokutira za sputtering. Zogulitsa zomwe zimagwiritsidwa ntchito poyika nthunzi ndi monga waya wa tungsten strand, mabwato a tungsten, mabwato a molybdenum, ndi maboti a tantalum zomwe zimagwiritsidwa ntchito popaka chitsulo chamagetsi ndi waya wa cathode tungsten, copper crucible, tungsten crucible, ndi ma molybdenum processing parts. zolinga, chromium targets, ndi titaniyamu-aluminiyamu chandamale.
